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Tungsten disilicide or tungsten silicide can also be called an inorganic silicide. Tungsten silicide comes in a dark-gray powder. Tungsten silicide’s use is to create anti-oxidation compounds and resistance wire compasses.
Particle Size: 5-10um
About Tungsten Silicide WSi2 Powder :
Tungsten Silicide (WSi2) is an inorganic compound that acts as a silicicide of tungsten. It’s a conductive material. Tungsten Silicide reacts strongly with strong acids and fluorine. WSi2 works well as an antioxidation coating. Similar to MoSi2 Molybdenum Disilicide MoSi2, this material’s high emissivity of the tungsten disilicide is attractive for high-temperature radiant cool and can be described as a heat shield.
Silicide has been used in microelectronics. With a resistivity range of 60-60cm, it can form 1000°C. You can prepare the silicide layer by chemical vapor dipping, which uses monosilane/dichlorosilane as the source gas. Non-stoichiometric film must be annealed to transform to a more stoichiometric version. Tungsten Silicide replaces the earlier tungsten film. Tungsten silicide powder can also be used in microelectromechanical systems and oxidation-resistant coatings.
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Tungsten Siicide WSi2 Powder Characteristics:
Tungsten silicide, WSi2 powder (CAS 120339-88-2), has a high melting temperature, good corrosion resistance and high oxidation resistance.
High-temperature ductility, conductivity and the binary alloy system is the intermediate phase.
Parameter Technical of Tungsten Silicide, WSi2 Powder:
Tungsten Siicide WSi2 Pulp:
How do you make Tungsten Silicide powder WSi2?
For synthetic silicide, tungsten pulverized powder, silicon powder and tungsten powder are the raw materials. In acetone, they last an average of 24 hours. While the powder 5: 1 is the starting powder, it is used for the measurement of thermometric measurements. Dried substances, and acetone evaporation. Heat treatment was performed at various temperatures from 50 ° C to different temperatures between 1250 and 1400 ° C. For 4 hours, the mixture was heated in an argon flow. Once the heat treatment has ended, the furnace should be brought to room temperature.
Tungsten Silicide Application WSi2 Pulver–
Tungsten silicide, WSi2 powder, is used as an electrical shock material in microelectronics. Tungsten silicide, which has a resistivity between 60 and 80cm, is used in microelectronics. You can prepare the layer of tungsten silicide by chemical vapor repositioning, like vapor reposition. You can use monosilane/dichlorosilane as a raw material gas, or tungstenhexafluoride. For a more conductive form, the film should be annealed.
Tungsten silicide may replace early tungsten films. Tungsten silicide may also be used as a barrier to other metals and silicon.
Tungsten silicide is also very valuable in micro-electromechanical systems, in which tungsten silicide is mainly used as a thin film for the manufacture of microcircuits. Plasma-etching tungsten silicide using silicide is possible for this purpose.
Packing & Shipping of Tungsten Silicide WSi2 Powder:
There are many options for packing, which all depend on the amount of tungsten silicide (WSi2) powder.
Tungsten silicide powder packaging: vacuum packed, 1kg/bag. 25kg/barrel or as you request
Tungsten silicide powder shipping: could send out by sea, air or express, as long as there is a payment receipt.
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