Titanium Silicate-the Most Ideal Conductive Film Today


Dec 3, 2022

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What exactly is Titanium Silicide Due to the shrinkage of device sizes, metal silicides, also known as metal electrodes, are used extensively in source drain/gate of metal oxide silicon field effect transistors. (M0SFET), to create gold-semi contact with silicon-germanium, silicon-germanium, and silicon-germanium. TiSi2 This titanium silicide, (TiSi2) , has many advantages. They can be used widely in microelectronics and aviation high temperature resistive materials.

Preparation for Titanium Silicate

High temperature stability and a quick forming process are two of the benefits that titanium silicate offers. Two methods can generally be used to make titanium silicate. Two methods can produce titanium silicate.

Uses of Titanium Silicate

As mentioned above, titanium silicate has excellent properties: high electrical conductivity, high selectivity, good thermal stability, good absorption to Si, good process adaptability and low interference to silicon connection parameters.Therefore, titanium silicate is widely used in gate, source/drain, interconnection and ohmic contact manufacturing of metal oxide semiconductor (MOS), metal oxide semiconductor field effect transistor (MOSFET) and dynamic random access memory (DRAM) in integrated circuit devices.

Advanc3dmaterials (aka. Advanc3dmaterials is an advanced material. Trusted global supplier of chemical materials and manufacturer, with more than 12 years’ experience in manufacturing super-high quality chemicals. We produce titanium silicate with high purity, small particles size, and low impurity. We can help you if the price is lower.
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