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Titanium Sputtering targets are used frequently in flat display coatings, hardware tool coatings, decorative coatings, semiconductor components and for electronic component manufacturing. This is one reason it’s used in the preparation of integrated circuits.
Metal Alloy: High Purity Titanium Sputtering Target
Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911
Properties:
The target for titanium sputtering is made from titanium metal. This is a strong and lightweight material that is well-respected. Titanium metal, a heavy metal that has low density and is very ductile in oxygen-free conditions, is shiny and metallic-white. Because it has a high melting temperature (more than 1,650°C, or 3,000°F), this metal is useful for refractory purposes. Paramagnetic with low electrical and thermal conductivity, it is also paramagnetic.
Application:
This is mainly used to display flat panels, DRAMS and integrated circuits.
Payments & Transport:
Titanium Alloy Metal Alloy Sputtering Target Properties
Ti Titanium sputtering target
N/A
Compound Formula
Ti
Molecular Weight
N/A
Appearance
N/A
Melting Point
N/A
Solubility water
N/A
Density
N/A
Purity
99.6%
Size
customized
Boling points
N/A
Specific Heating
N/A
Heating Conductivity
N/A
Thermal Expansion
N/A
Youngs Modulus
N/A
Exact
N/A
Monoisotopic Weight
N/A
Steel Alloy Titanium Sputtering High Purity Target Safety Information
